ЛИТОГРАФИЯ
| 期 | 标题 | 文件 | |
| 卷 54, 编号 4 (2025) | Perspectives of electron-beam and ion-beam lithography development in Russia |
 (Rus) |
|
| Zaitsev S., Irzhak D., Il’in A., Knyazev M., Roshchupkin D., Grachev V., Kurbatov V., Malkov G. | |||
| 卷 54, 编号 1 (2025) | Investigation of double patterning method with the usage of antispacer |
(Rus) |
|
| Tikhonova E., Gornev E. | |||
| 卷 53, 编号 5 (2024) | New concept for the development of high-performance X-ray lithography |
(Rus) |
|
| Chkhalo N. | |||
| 卷 52, 编号 5 (2023) | Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range |
(Rus) |
|
| Zuev S., Lopatin A., Luchin V., Salashchenko N., Tsybin N., Chkhalo N. | |||
| 卷 52, 编号 2 (2023) | Cross Sections of Scattering Processes in Electron-Beam Lithography |
(Rus) |
|
| Rogozhin A., Sidorov F. | |||
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